PHI Genesis — High-Performance XPS (X-ray Photoelectron Spectroscopy) System

PHI Genesis — High-Performance XPS (X-ray Photoelectron Spectroscopy) System

PHI Genesis is a highly sensitive and versatile XPS system designed for materials science, chemical analysis, and surface characterization. With advanced automation, a user-friendly interface, and unique analytical capabilities, it provides researchers and industrial users with nanoscale surface analysis.

Key Features

• High Spatial Resolution: Detailed analysis of micro-regions with ≤ 7.5 µm resolution.

• Advanced Automation: Smart software for simplified sample loading, alignment, and data acquisition.

• Multiple Analysis Modes: Supports XPS, AES (Auger Electron Spectroscopy), and UPS (Ultraviolet Photoelectron Spectroscopy).

• Broad Energy Range: In-depth elemental and chemical analysis with 0–15 keV energy range.

• User-Friendly Interface: Fast and error-free data processing via PHI’s SmartSoft™ software.

Application Areas

• Materials Science: Surface composition of thin films, coatings, and composites.

• Semiconductor Industry: Chemical mapping of nanostructures.

• Biomaterials: Characterization of biocompatible surfaces.

• Energy Storage: Electrode analysis for batteries and fuel cells.

• Quality Control: Detection of contamination or corrosion.

Technical Specifications

• X-ray Source: Monochromatic Al Kα (1486.6 eV).

• Analyzer Type: High-transmission spherical analyzer.

• Vacuum System: Base vacuum < 5×10⁻⁹ Torr.

• Sample Size: Samples up to 200 mm in diameter.

• Detectors: 16-channel detector for rapid data collection.