LEAP 5000 XS

High Performance 3D Atom Probe for Semiconductors, Electronic Devices, and Nanomagnetics

The LEAP 5000 XSTM is a high performance atom probe microscope which provides nano-scale surface, bulk and interfacial materials analysis of simple and complex structures with atom-by-atom identification and accurate spatial positioning.
The system works using the principle of field evaporation, whereby a strong electric field applied to the specimen is sufficient to cause removal of atoms by ionization. Atom removal is triggered either via a voltage or laser pulse applied to the sample.

The LEAP 5000 XS provides the following key features:

Fastest data collection speed
Local electrode and microtip compatibility
Variable flight path